Back to Integrated Microscopy Center Home
AJA Orion 5 Deposition Unit Contact

Deposition Unit

Technical Data

  • Designed to accommodate wafers up to 4² (~100 mm) in diameter
  • One dc and two rf power sources for the sputtering targets
  • Three 2.5² (~63.5 mm) diameter sputter guns
  • Substrate heating to 850°C
  • Substrate rotation
  • Substrate biasing for cleaning
  • Main-chamber base pressure 8x10-8 Torr or better

Under Construction

Users interested in using the AJA Orion 5 Deposition Unit should contact:

Dr. Felio Perez - fperez@memphis.edu

Text Only | Print | Got a Question? Ask TOM | Contact Us | Memphis, TN 38152 | 901/678-2000 | Copyright 2014 University of Memphis | Important Notice | Last Updated: 
Last Updated: 11/5/13