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Taramark 152 Mask Aligner and Exposure System Contact

Mask Aligner

Technical Data

  • Designed to accommodate wafers of 4” and 2” in diameter, 3” x 1”glass microscope slides, and 1cmx1cm substrates
  • Collimation half angle: < 3°
  • Declination angle: < 2°
  • Intensity: > 45 mW/cm² at broadband (350-450nm); > 25 mW/cm² at 365 nm
  • Uniformity: <+ 6%
  • Exposure wavelength from 350 nm to 450 nm, with intensity peaks at 365nm (i-line), 405nm (h-line), and 436nm (g-line)

Under Construction

Users interested in using the Taramark 152 Mask Aligner and Exposure System should contact:

Dr. Felio Perez - fperez@memphis.edu

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Last Updated: 11/5/13