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Laurell WS 650 Spin Coater Contact

Spin coater

Technical Data

  • Maximum spin speed: 12k RPM
  • Ramp: up to 13,000 RPM/s in 1 RPM increments
  • Time: 1s to 99 minutes 59.9 s in 0.1s increments
  • Maximum substrate size that will fit in bowl: 6² (~150 mm) wafer in diameter or 5² (~125 mm) square substrate
  • Recipe storage: twenty 51-step programs
  • Vacuum chuck: 1.75² (~45 mm) in diameter for 2² (~50 mm) through 6²(~150 mm) in diameter substrates
  • Fragment chuck adapter: for holding ~3 mm through 15 mm pieces
  • Fragment chuck adapter: for holding ~5 mm through 25 mm pieces
  • Fragment chuck adapter: for holding 10 mm through ~50 mm pieces
  • Microscope slide adapter: for holding 1² x 3² or 25 mm x 75 mm

Under Construction

 

Users interested in using the Laurell WS 650 Spin Coater should contact:

Dr. Felio Perez - fperez@memphis.edu

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Last Updated: 11/6/13