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Laurell WS 650 Spin Coater Specifications

Technical Data

  • Maximum spin speed: 12k RPM.
  • Ramp: up to 13,000 RPM/s in 1 RPM increments.
  • Time: 1s to 99 minutes 59.9 s in 0.1s increments.
  • Maximum substrate size that will fit in bowl: 6² (~150 mm) wafer in diameter or 5² (~125 mm) square substrate.
  • Recipe storage: twenty 51-step programs.
  • Vacuum chuck: 1.75² (~45 mm) in diameter for 2² (~50 mm) through 6²(~150 mm) in diameter substrates.
  • Fragment chuck adapter: for holding ~3 mm through 15 mm pieces.
  • Fragment chuck adapter: for holding ~5 mm through 25 mm pieces.
  • Fragment chuck adapter: for holding 10 mm through ~50 mm pieces.
  • Microscope slide adapter: for holding 1² x 3² or 25 mm x 75 mm.
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Last Updated: 10/31/13