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What is XPS?

XPS is a widely used surface analysis technique. It is based on irradiating a sample with mono-energetic X-rays causing photoelectrons to be emitted from the sample surface. The binding energy of the photoelectrons is then determined by an electron energy analyzer. From the binding energies and intensities photoelectron peaks, the elemental identities, chemical states, and quantities of the elements present on a surface are determined.

XPS provides information about surface layers or thin film structures that is useful for applications such as magnetic media, semiconductor and dielectric materials, electronics packaging, polymer surface modification, catalysis, corrosion, adhesion, and thin film coatings.

Main Features & Specifications

  • UHV Condition at better than 2 x 10-9 mbar

  • Maximum sample size of 60 x 60 x 20mm

  • X-ray Monochromator:

    • Ag 3d5/2 peak with full width at half-maximum energy resolution of 0.50 eV
    • Spot size of 30µm to 400µm

    • Charge compensation by electrons and low energy ions (Ar+)

  • Ion Gun: <500 µm spot size, 100eV - 4keV, 1uA at 200eV

  • Lateral resolution of better than 30 µm for imaging 128 Channel Electron Analyzer

  • Large acceptance angle of >60°

  • 1.0eV (FWHM) on the silver 3d5/2 with a peak height of 2,000,000 cps using an X-ray spot size of 400 µm

  • Angular Resolved XPS for non-destructive depth analysis of thin films

  • Work function measurements capability

Users interested in using the              X-ray Photoelectron Spectrometer (XPS) should contact:

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Last Updated: 9/26/14